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Our Imported Product list
Desk Carbon Coating System compact carbon fiber coating system suitable for sample preparation for use in scanning electron microscope (SEM), Transmission electron microscope (TEM) and X-Ray analysis (EDX).
Desktop Sputter Coater enables thin film sputter coating of noble metals: gold (Au), palladium (Pd), platinum (Pt) and gold/palladium (Au/Pd) on non-conductive or poorly conductive samples or devices. Our board computer integration makes the Desktop Sputter coater an ideal laboratory and research tool for scanning electron microscopy (SEM) and Transmission electron microscopy analysis(TEM).
Pulsed Laser Deposition technique leads to efficient, none-thermal ablation and preserves the stoichiometry of the target materials. By applying this method it could deposit materials such as nitrides, oxides, superlattices, polymers, and composites. PLD is equipped with a multi-target manipulator which includes three 2 cm diameters. Targets are in standard size. All of our target manipulators are motorized and include target rotation
Desk Carbon Coating System compact carbon fiber coating system suitable for sample preparation for use in scanning electron microscope (SEM), Transmission electron microscope (TEM) and X-Ray analysis (EDX).
Desktop Coaters
RF Generators for Sputtering and Plasma generators are reliable devices for industrial and laboratory deposition, plasma generation, and even dielectric heating and melting. The RF generator is designed and built with 27.12 MHz, 13.56 MHz, 2 MHz, or other frequency bands according to the customer.
This device is also one of the most important components of semiconductor manufacturing systems, used for producing integrated circuits (ICs) and chips present in modern computers and electronic equipment The high-voltage power supplies are offered in the 800-120000 V range.
Also known as: * Sputtering guns, * Magnetron Sputtering * Cathode Diodes single-style magnetron that is compatible with both DC and RF power sources, they are manufactured to work effortlessly with the plasma power sources.
RF Generators for Sputtering and Plasma generators are reliable devices for industrial and laboratory deposition, plasma generation, and even dielectric heating and melting. The RF generator is designed and built with 27.12 MHz, 13.56 MHz, 2 MHz, or other frequency bands according to the customer.
RF & DC Power Supplies
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Sputtering RF and DC Magnetrons
Our range of Plasma Cleaner/Asher (desktop reaction chamber) unit can facilitate the removal of atomic contamination, removal of Oxides, and Hydrophilic/Hydrophobic plasma treatment.
There are many differences between the nature of plasma, at 40 kHz, 400 KHz Microwave and 13.56 MHz RF.
In general, at low frequencies, both electrons and ions are displaced in the plasma medium. Ions have a negative or positive electric charge, and the mass of ions is much higher than that of an electron.
Our range of Plasma Cleaner/Asher (desktop reaction chamber) unit can facilitate the removal of atomic contamination, removal of Oxides, and Hydrophilic/Hydrophobic plasma treatment.
Plasma Cleaner/Asher
We are an authorized partner of VAC TECHNICHE UK-based Specialists in vacuum technology, thin film material deposition systems, analytical research equipment, AFM, SEM thin-film coaters, bespoke scientific glassware, and application consultant.